Double zones intelligent PECVD systemBTF-1200C-II-AS-500A)
The high-temperature vacuum resistance furnace temperature control system of this equipment adopts a classic closed-loop negative feedback control system. The temperature control instrument adopts intelligent program temperature adjustment instrument temperature control and power modulator control; the load is controlled by small voltage and high current, which greatly improves heat generation The life of the component, the temperature measuring component adopts K type thermocouple. 30-segment programmable temperature control, PID parameter self-tuning, operation interface is 10-inch industrial control computer, built-in PLC control program, can set the temperature control system, slide rail furnace sliding (time and distance) as program control. At the same time, the system is equipped with over-temperature, under-temperature and broken-couple alarm protection functions, which greatly reduces the requirements for the operator's experience. The key electrical components are made of high-quality imported products to achieve high performance, maintenance-free, and improve the reliability of equipment quality .
PECVD is to produced plasma by glow discharge .In the glow discharge plasma, the electron density is 109-1012cm3 and the temperature of the electron gas is 10-100 times higher than that of the ordinary gas molecule, which results in the chemical reaction of the gaseous substance containing the thin film. Thus, a new preparation technique for the growth of thin film materials is developed. By reactive gas discharge, the reaction characteristics of non-equilibrium plasma are effectively utilized, and the energy supply mode of the reaction system is fundamentally changed. The low temperature plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process is simple.
equipped with front-end preheating furnace to assist solid source evaporation, suitable for growth process of two-dimensional materials, plasma treatment , also for the rapid heating and cooling of the CVD experiment.
suggested heating rate：10℃/min
temp. control：PID automatic control with 30 steps programmable
heating element：resistance wire
heating element：resistance wire（Fe-Cr-Al Alloy doped by Mo）
Heating zone length：400mm（200+200mm）
Constant zone length: 200mm (100+100mm)（±1℃）
tube：high piruty quartz Φ25\50\60\80\100\150x2000mm (optional)
remark：Optional single temperature zone, double temperature zone, three temperature zone and other heating zones.
gas supply system
Mass Flowmeter reference range（N2)100sccm、200sccm、500sccm （optional）
response time：gas：1～4 Sec，electricity：10 Sec
Working pressure difference range：0.1～0.5 MPa
remark:1 channel, 2 channel,3 channel,4 channel are optional
Signal frequency：13.56 MHz±0.005%
Power output range：0-500W
RF output interface：50 Ω, N-type, female
Note: The power of the RF source can be selected according to the size of the cavity.