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Double zones intelligent PECVD systemBTF-1200C-II-AS-500A)
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Double zones intelligent PECVD systemBTF-1200C-II-AS-500A)

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Mailbox:beq02@ahbeq.com;besteq@163.com
Telephone:+86 173 5409 7574
Product description
Product parameters

 Main feature

  The high-temperature vacuum resistance furnace temperature control system of this equipment adopts a classic closed-loop negative feedback control system. The temperature control instrument adopts intelligent program temperature adjustment instrument temperature control and power modulator control; the load is controlled by small voltage and high current, which greatly improves heat generation The life of the component, the temperature measuring component adopts K type thermocouple. 30-segment programmable temperature control, PID parameter self-tuning, operation interface is 10-inch industrial control computer, built-in PLC control program, can set the temperature control system, slide rail furnace sliding (time and distance) as program control. At the same time, the system is equipped with over-temperature, under-temperature and broken-couple alarm protection functions, which greatly reduces the requirements for the operator's experience. The key electrical components are made of high-quality imported products to achieve high performance, maintenance-free, and improve the reliability of equipment quality .

 PECVD is to produced plasma by glow discharge .In the glow discharge plasma, the electron density is 109-1012cm3 and the temperature of the electron gas is 10-100 times higher than that of the ordinary gas molecule, which results in the chemical reaction of the gaseous substance containing the thin film. Thus, a new preparation technique for the growth of thin film materials is developed. By reactive gas discharge, the reaction characteristics of non-equilibrium plasma are effectively utilized, and the energy supply mode of the reaction system is fundamentally changed. The low temperature plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process is simple.

    equipped with front-end preheating furnace to assist solid source evaporation, suitable for growth process of two-dimensional materials, plasma treatment , also  for the rapid heating and cooling of the CVD experiment.

 

  technical parameter

 

preheater

max temp:400℃

max.heating rate:≤30℃/min

suggested heating rate:10℃/min

temp. control:PID automatic control with 30 steps programmable

voltage:AC220V

power:800W

accuracy:±1℃

heating element:resistance wire

加热区参数:

heating element:resistance wire(Fe-Cr-Al Alloy doped by Mo)

Heating zone length:400mm(200+200mm)

Constant zone length: 200mm  (100+100mm)(±1℃)

Working temp:1100℃

Max. temp:1200℃
temp. control:PID automatic control with 30 steps programmable,Operation interface is 7 "industrial control computer 

accuracy:±1℃

max.heating rate:≤30℃/min

tube:high piruty quartz Φ25\50\60\80\100\150x2000mm  (optional)

remark:Optional single temperature zone, double temperature zone, three temperature zone and other heating zones.

gas supply system

Mass Flowmeter reference range(N2)100sccm、200sccm、500sccm (optional)

Accuracy:±1.5%

Linear:±0.5~1.5%

response time:gas:1~4 Sec,electricity:10 Sec

Working pressure difference range:0.1~0.5 MPa

max. pressure:3MPa

 

remark:1 channel, 2 channel,3 channel,4 channel are optional

vacuum unit

pump model:BSV-10

pumping rate:10m³/h

ultimate vacuum:5*10-1pa

inlet/outlet:KF25

oil capacity:1.1L

rotating rate:1440rpm

noise:≤56db

RF generator

Signal frequency:13.56 MHz±0.005%

Power output range:0-500W

RF output interface:50 Ω, N-type, female

 

Note: The power of the RF source can be selected according to the size of the cavity.

 

Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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