CVD equipment for preparing composite oxide hydrogen separation membrane

　　Main feature

　It can realize the chemical deposition of oxide (SiO2, Al2O3, TiO2, ZrO2) and composite oxide (Al2O3-SiO2, SiO2-TiO2, SiO2-ZrO2) hydrogen separation membrane on porous alumina ceramic tubes and ceramic sheets.

　structure

　　1) The main body heating is a three-stage heating system with a maximum operating temperature of 1000 ℃;

　　2) Three liquid sources heat the evaporation bubbler, the maximum temperature is 300 ℃, and the temperature is controlled independently.

　　3) The three channles gas inlet, respectively nitrogen, argon and hydrogen, can directly enter the gas mixing chamber and enter the vacuum chamber, and the flow rate can be controlled separately, and the flow meter control accuracy is ± 1.5% F.S. In addition, nitrogen is used as a purge gas, which enters the three liquid sources in parallel through the flowmeter and then enters the gas mixing chamber. Each of the three channels is equipped with a separate valve control.

　　4) The ceramic blind tube has a length of 620mm, an outer diameter of 12mm, and an inner diameter of 9mm. From 250mm to 350mm from the open end, it is a deposition section with an aperture of 0.2μm, and the outer walls of the remaining tubes have been glazed;

　　5) The sample of the ceramic sheet has a diameter of 30 mm and a thickness of 3 mm. 3 sample stages, each of which can place 3 ceramic samples at the same time.

　　6) space as small as possible

　　7) Rear vacuum connection system.

　　technical parameter