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Anhui BEQ Equipment Technology Co., Ltd
Hefei Baisi New Materials Research Institute
Hefei Oulai Di Optoelectronics Technology Co., Ltd
Copyright 2017 Anhui BEQ Equipment Technology Co., Ltd. 皖ICP备12002778号-1 Powered by: www.300.cn
BTF-1200C-R-S-PECVD/Small rotary type PECVD
Main features
The tube of the equipment can be rotated 360 degrees, and the quartz baffle on the inner wall of the tube helps the powder to be turned over to help the sintering to be more uniform;
It can be tilted from left to right at a large angle to facilitate the discharge. The tilt angle is between 0~35°.
The device is a fully automated Plasma Enhanced CVD System (PECVD),can achieve continuous sliding temperature zones and to continuously control the temperature and plasma intensity.Equipped with vacuum unit,can realize experiments under low pressure conditions, such as low temperature graphene and carbon nanotube growth. PECVD system enables the entire experimental cavity to be in the glow generation area, and the glow is evenly equivalent. This technique solves the unstable state of the traditional plasma operation, so the range and intensity of ionization. It is a hundred times more than traditional PECVD and solves the problem of uneven material accumulation.
Used for prepare metal composite graphene material,is the most high-end preparation equipment for metal composite material
Technical Parameters
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Furnace |
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Max. Temp |
1100℃ |
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PID automatic control and auto-tune function. 30 programmable segments for precise thermal processing. Built-in protection for the over-heated and broken thermocouple. 10" LCD touch screen and industrial instrumentation dual temperature control
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Heating Elements |
·Resistance wire, Fe-Cr-Al Alloy doped by Mo
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Temperature Accuracy |
+/- 1℃ |
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Processing tube
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·Size：Φ25*800（middle sizeΦ50*225） Furnace tube rotation rate：3~13r/min |
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Furnace body inclination angle |
0~35°（adjustable） |
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PE source |
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Signal frequency |
13.56 MHz±0.005% |
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Power output range |
0-150W |
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RF output interface |
50 Ω, N-type, female |
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Power stability |
≤5W |
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Gas supply system |
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High precision mass Flowmeter（Range optional） |
high precise MFC(optional) |
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Accuracy |
±1.5% |
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Response accuracy |
·±0.2% |
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Response time |
Gas characteristics：1～4sec Electrical characteristics:10sec |
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Working pressure difference range |
0.1～0.5MPa |
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Max. pressure |
·3MPa |
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Connection |
Φ6mmDouble clasp stainless steel joint |
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Vacuum unit |
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KF25 series bellows and manual stopper valves |
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Vacuum up to10-1Pa |
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The value can be displayed intuitively by the digital display vacuum tester |
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