PECVD system with preheater & double zones sliding tube furnace /BTF-1200C-II-SL-400C-PECVD

feature & function

  PECVD is to produced plasma by glow discharge .In the glow discharge plasma, the electron density is 109-1012cm3 and the temperature of the electron gas is 10-100 times higher than that of the ordinary gas molecule, which results in the chemical reaction of the gaseous substance containing the thin film. Thus, a new preparation technique for the growth of thin film materials is developed. By reactive gas discharge, the reaction characteristics of non-equilibrium plasma are effectively utilized, and the energy supply mode of the reaction system is fundamentally changed. The low temperature plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process is simple.

Equipped with front-end preheating furnace, auxiliary solid-state source evaporation, back-end double zones heating furnace, accurate temperature control, simple operation, suitable for vapor deposition, two-dimensional materials, plasma treatment growth process, and also suitable for rapid rise Cooling CVD experiment.

 1.Compared with traditional CVD systems, the growth temperature is lower.

 2.realize rapid heating/cooling rate with sliding furnace

 3.The glow of the whole tube is uniform and equivalent, and grows uniformly

 1.heating system

2、preheater

3、RF generator

4、three channles Gas supply system

5、Low vacuum unit