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PECVD system with preheater
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Product name

PECVD system with preheater

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Mailbox:beq02@ahbeq.com;besteq@163.com
Telephone:+86 173 5409 7574
Product description
Product parameters

Main feature:

PECVD is to produced plasma by glow discharge .In the glow discharge plasma, the electron density is 109-1012cm3 and the temperature of the electron gas is 10-100 times higher than that of the ordinary gas molecule, which results in the chemical reaction of the gaseous substance containing the thin film. Thus, a new preparation technique for the growth of thin film materials is developed. By reactive gas discharge, the reaction characteristics of non-equilibrium plasma are effectively utilized, and the energy supply mode of the reaction system is fundamentally changed. The low temperature plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process is simple.

Set vacuum unit, gas supply system, RF source, automatic propulsion, heating furnace in on.All the controls are integrated into the touch screen control interface to make the device more intelligent and easy to operate.

 

 

Any PECVD system can be equipped with front-end preheating furnace to assist solid source evaporation, suitable fot growth process of two-dimensional materials, plasma treatment , also for the rapid heating and cooling of the CVD experiment.

 

 

 

Parameter

 

Preheater

Working temperature

350℃

Max. temperature

400℃

Max. Heating rate

30℃/min

Suggest heating rate

10℃/min

Temperature control

30 segment progress temp. Control

Voltage

AC220 V

Power

800W

Temperature accuracy

±1℃

Heat element

Resistance wire

 

Furnace

Max. temp

1200°C

Heating zone length

440mm

Constant zone length

200mm

Temp. control

PID automatic control with 30 steps programmable,Operation interface is 7 "industrial control computer

Tube size

Ø 25,,Ø50,Ø60,,Ø80,,Ø100(customizable)

 

 

PE source:   

Signal frequency

13.56 MHz±0.005%

Power output range

0-500W

Max. reflection power

100W

RF output interface

50 Ω, N-type, female

Power stability

≤5W

 

Gas supply system

Accurate control of gas flow with high precision mass Flowmeter

Mass Flowmeter reference range(N2)

100sccm、200sccm 500sccm (optional)

Accuracy

±1.5%

Repeatability precision

±0.2%

Working pressure difference range

0.1~0.5 MPa

Max. pressure

3MPa

 

Vacuum unit

KF25 series bellows and manual stopper valves

vacuum

10-1 pa

The value can be displayed intuitively by the digital display vacuum tester

 

Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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