Non-gaseous source chemical vapor deposition system BTF-1200C-S-SL-CVD

main feature

　　consists of electric sliding tube furnace, three channles gas supply system, vacuum and filtration system, precursor bubbling device, gas preheating device, software control and other parts. Suitable for precursors that are non-gaseous sources, such as solid or liquid precursors, the filling temperature of the precursor can reach 400 ° C, and the temperature can be adjusted independently. After the solid or liquid precursor is evaporated at a certain temperature, it is brought into the reaction area through inert gas Some CVD reactions.

structure

1.   The intake and exhaust of the left and right ends can be switched between each other; improve the uniformity of the coating on the substrate;

2.    The bottom of the furnace body can be moved horizontally on the guide rail under the drive of the motor, and the moving speed can be set according to the process requirements.　

3.    Using touch screen and industrial control computer automatic control, parameter setting and operation are intuitive and convenient, and parameter automatic record keeping.

4.   The gas supply system can be equipped with several mass flow meters according to the customer's experimental needs. The range of the flow meter is optional. The vacuum system can also be equipped with various vacuum pumps according to the customer's needs.

technical parameter

heating system

3 channels MFC

Vacuum unit