A delegation from the Economic Development Zone of Feixi County investigated the company's products and scientific research results
Recently, Lu Ge, member of the Standing Committee of the Feixi County Party Committee, deputy head, and first secretary of the Economic Development Zone of Feixi County, visited the company. General Manager Kong Lingjie warmly received and accompanied the inspection.
Leaders of Hefei Investment Promotion Bureau surveyed the Best R & D Center
On March 8, 2019, Zhu Shengli, deputy secretary general of the Hefei Municipal Government and director of the Investment Promotion Bureau, and his party visited the product research and development center of Best Group. Research.
Best Group 2018 Highlights
On January 30, 2019, Best Group ’s annual meeting was successfully held!
The Fifth National Energy Storage Science and Technology Conference
From October 26 to 28, 2018, the Fifth National Energy Storage Science and Technology Conference was held at Huazhong University of Science and Technology.
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Anhui BEQ Equipment Technology Co., Ltd

Hefei Baisi New Materials Research Institute

Hefei Oulai Di Optoelectronics Technology Co., Ltd

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Copyright 2017  Anhui BEQ Equipment Technology Co., Ltd.   皖ICP备12002778号-1   Powered by: www.300.cn

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Product name

PECVD-500A/PECVD-S-150A

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Mailbox:beq02@ahbeq.com;besteq@163.com
Telephone:+86 173 5409 7574
Product description
Product parameters

Main feature:

PECVD is to produced plasma by glow discharge .In the glow discharge plasma, the electron density is 109-1012cm3 and the temperature of the electron gas is 10-100 times higher than that of the ordinary gas molecule, which results in the chemical reaction of the gaseous substance containing the thin film. Thus, a new preparation technique for the growth of thin film materials is developed. By reactive gas discharge, the reaction characteristics of non-equilibrium plasma are effectively utilized, and the energy supply mode of the reaction system is fundamentally changed. The low temperature plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process is simple.

Set vacuum unit, gas supply system, RF source, automatic propulsion, heating furnace in on.All the controls are integrated into the touch screen control interface to make the device more intelligent and easy to operate.

Main parameter:

Furnace

Max. temp

1200°C

Heating zone length

440mm

Constant zone length

200mm

Temp. control

PID automatic control with 30 steps programmable,Operation interface is 7 "industrial control computer

Tube size

Ø 25,Ø50,Ø60,Ø80,Ø100(optional)

 

 

PE source:   

Signal frequency

13.56 MHz±0.005%

Power output range

0-500W

Max. reflection power

100W

RF output interface

50 Ω, N-type, female

Power stability

≤5W

 

Gas supply system

Accurate control of gas flow with high precision mass Flowmeter

Mass Flowmeter reference range(N2)

100sccm、200sccm 500sccm (optional)

Accuracy

±1.5%

Repeatability precision

±0.2%

Working pressure difference range

0.1~0.5 MPa

Max. pressure

3MPa

 

Vacuum unit

KF25 series bellows and manual stopper valves

vacuum

10-1 pa

The value can be displayed intuitively by the digital display vacuum tester

 

 

 

 

 

Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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