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Anhui Bei Keke Equipment Technology Co., Ltd
Hefei Baisi New Materials Research Institute
Hefei Oulai Di Optoelectronics Technology Co., Ltd
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gas control system with 2 MFC
gas control system with 2 MFC GMF-2Z
The gas supply system can control the mixing of the two gases at different flow rates. It can also be equipped with a scrubbing device according to the experimental requirements. The mass flow meter is installed in a sealed movable cabinet. It is composed of precision double ferrule joints. This equipment forms a CVD system with various vacuum tube furnaces and vacuum units of BEQ brand.
Configuration components |
Technical Parameters |
|
MFC |
voltage |
185~245V 50HZ |
max. power |
18W |
|
range |
100sccm,200sccm(Nitrogen calibration,range optional) |
|
Working temp. |
5~45℃ |
|
Working pressure difference |
0.1~0.5MPa |
|
Max. pressure |
3MPa |
|
Accuracy |
±1.5% FS |
|
Mechanical pressure gauge |
Pressure vacuum gauge |
-0.1~0.15 MPa(0.01 MPa/grid) |
Needle valve |
stainless steel 316 |
|
Gas mixing tank |
Φ80×120mm |
|
Shut-off valve |
Φ6mm,stainless steel 316 |
|
size |
600×600×650 mm |