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Anhui BEQ Equipment Technology Co., Ltd
Hefei Baisi New Materials Research Institute
Hefei Oulai Di Optoelectronics Technology Co., Ltd
Copyright 2017 Anhui BEQ Equipment Technology Co., Ltd. 皖ICP备12002778号-1 Powered by: www.300.cn
gas control system with 2 MFC
gas control system with 2 MFC GMF-2Z
The gas supply system can control the mixing of the two gases at different flow rates. It can also be equipped with a scrubbing device according to the experimental requirements. The mass flow meter is installed in a sealed movable cabinet. It is composed of precision double ferrule joints. This equipment forms a CVD system with various vacuum tube furnaces and vacuum units of BEQ brand.
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Configuration components |
Technical Parameters |
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MFC |
voltage |
185~245V 50HZ |
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max. power |
18W |
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range |
100sccm，200sccm（Nitrogen calibration，range optional） |
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Working temp. |
5~45℃ |
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Working pressure difference |
0.1~0.5MPa |
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Max. pressure |
3MPa |
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Accuracy |
±1.5% FS |
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Mechanical pressure gauge |
Pressure vacuum gauge |
-0.1~0.15 MPa（0.01 MPa/grid） |
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Needle valve |
stainless steel 316 |
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Gas mixing tank |
Φ80×120mm |
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Shut-off valve |
Φ6mm,stainless steel 316 |
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size |
600×600×650 mm |
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