Product Center

A high-tech enterprise integrating R&D, manufacturing, sales, and technical services for new materials and equipment.

Heat treatment equipment
Heating method
Heating temperature
Heating temperature zone
Pipe diameter
condition:
clear condition

1200℃ Intelligent PECVD System PECVD-500A

1200℃ Intelligent PECVD System PECVD-500A

1200℃ Three-Zone Sliding-Rail PECVD System PECVD-500A-III

1200℃ Three-Zone Sliding-Rail PECVD System PECVD-500A-III

Vacuum Plasma Gas Reactor PE-1000W-4ZL

Vacuum Plasma Gas Reactor PE-1000W-4ZL

1200℃ Small Dual-Temperature-Zone Rotary PECVD BTF-1200C-S-R-II-PECVD

1200℃ Small Dual-Temperature-Zone Rotary PECVD BTF-1200C-S-R-II-PECVD

Vacuum Plasma Gas Reactor PE-500W-3ZL

Vacuum Plasma Gas Reactor PE-500W-3ZL

1200℃ Intelligent Sliding-Rail Furnace BTF-1200C-SL-A2

1200℃ Intelligent Sliding-Rail Furnace BTF-1200C-SL-A2

1200℃ Small Three-Zone PECVD System BTF-1200C-III-S-PECVD

1200℃ Small Three-Zone PECVD System BTF-1200C-III-S-PECVD

1400℃ PECVD System BTF-1400C-D-CVD

1400℃ PECVD System BTF-1400C-D-CVD

1200℃ Continuous Feed-and-Discharge Rotary PECVD System BTF-1200C-R-PECVD-AD2

1200℃ Continuous Feed-and-Discharge Rotary PECVD System BTF-1200C-R-PECVD-AD2

1200℃ Intelligent PECVD System PECVD-III-500A-D210

1200℃ Intelligent PECVD System PECVD-III-500A-D210

1200℃ Benchtop Plasma-Enhanced Vacuum Rotary Furnace BTF-1200C-R-PECVD

1200℃ Benchtop Plasma-Enhanced Vacuum Rotary Furnace BTF-1200C-R-PECVD

1200℃ Intelligent PECVD System (including Pressure Control System) PECVD-500A-D

1200℃ Intelligent PECVD System (including Pressure Control System) PECVD-500A-D

1200℃ Plasma-Enhanced Chemical Vapor Deposition System for Smooth Rail Surfaces

1200℃ Plasma-Enhanced Chemical Vapor Deposition System for Smooth Rail Surfaces

1200℃ Plasma-Enhanced Chemical Vapor Deposition System for Smooth Rail Surfaces

1200℃ Plasma-Enhanced Chemical Vapor Deposition System for Smooth Rail Surfaces

1200℃ three-zone PECVD BTF-1200C-III-500A

1200℃ three-zone PECVD BTF-1200C-III-500A

1200℃ Dual-Temperature-Zone PECVD PECVD-II-500A

1200℃ Dual-Temperature-Zone PECVD PECVD-II-500A

1200℃ Front-End Preheating Sliding-Rail PECVD BTF-1200C-II-SL-PECVD

1200℃ Front-End Preheating Sliding-Rail PECVD BTF-1200C-II-SL-PECVD

Plasma-Enhanced Rotary PECVD System BTF-1200C-R-PECVD

Plasma-Enhanced Rotary PECVD System BTF-1200C-R-PECVD

Three-temperature-zone intelligent plasma chemical vapor deposition system (BTF-1200C-III-500A-PECVD)

Three-temperature-zone intelligent plasma chemical vapor deposition system (BTF-1200C-III-500A-PECVD)

Continuous Inlet/Outlet Plasma-Enhanced Rotary PECVD Equipment BTF-1200C-RP-PECVD

Continuous Inlet/Outlet Plasma-Enhanced Rotary PECVD Equipment BTF-1200C-RP-PECVD

1200℃ Dual-Furnace Sliding-Rail PECVD

1200℃ Dual-Furnace Sliding-Rail PECVD

1200℃ Three-Independent Intelligent Sliding-Rail PECVD PECVD-III-500A-SSSL

1200℃ Three-Independent Intelligent Sliding-Rail PECVD PECVD-III-500A-SSSL

RF power supply 150W/300W/500W

RF power supply 150W/300W/500W

1200℃ Three-Zone Sliding-Rail PECVD System BTF-1200C-III-SL-PECVD

1200℃ Three-Zone Sliding-Rail PECVD System BTF-1200C-III-SL-PECVD

1200℃ Dual-Temperature-Zone PECVD System BTF-1200C-II-SL-PECVD

1200℃ Dual-Temperature-Zone PECVD System BTF-1200C-II-SL-PECVD

1200℃ Single-Zone Sliding-Rail PECVD System BTF-1200C-SL-PECVD

1200℃ Single-Zone Sliding-Rail PECVD System BTF-1200C-SL-PECVD

1200℃ Small Sliding-Rail PECVD System BTF-1200C-S-SL-PECVD

1200℃ Small Sliding-Rail PECVD System BTF-1200C-S-SL-PECVD

1200℃ Micro PECVD System BTF-1200C-S-PECVD

1200℃ Micro PECVD System BTF-1200C-S-PECVD

Roll-to-Roll Continuous Graphene Growth PECVD Equipment RTR-III-150

Roll-to-Roll Continuous Graphene Growth PECVD Equipment RTR-III-150

Miniature Intelligent Plasma-Enhanced Chemical Vapor Deposition System BTF-1200C-S-R-PECVD

Miniature Intelligent Plasma-Enhanced Chemical Vapor Deposition System BTF-1200C-S-R-PECVD

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